Digital photoelastic analysis applied to implant dentistry

Ramesh, K. and Hariprasad, M.P. and Bhuvanewari, S. (2016) Digital photoelastic analysis applied to implant dentistry. Optics and Lasers in Engineering, 87. pp. 204-213. ISSN 01438166

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Abstract

Development of improved designs of implant systems in dentistry has necessitated the study of stress fields in the implant regions of the mandible/maxilla for better understanding of the biomechanics involved. Photoelasticity has been used for various studies related to dental implants in view of whole field visualization of maximum shear stress in the form of isochromatic contours. The potential of digital photoelasticity has not been fully exploited in implant dentistry. In this paper, the fringe field in the vicinity of connected implants (All-On-Four® concept) is analyzed using recent advances in digital photoelasticity. Initially, a novel 3-D photoelastic model making procedure, to closely mimic all the anatomical features of the human mandible, is proposed. By choosing appropriate orientation of the model with respect to the light path, the essential region of interest was analyzed while keeping the model under live loading conditions. Need for a sophisticated software module to carefully identify the model domain has been brought out. For data extraction, five-step method is used and isochromatics are evaluated by twelve fringe photoelasticity. In addition to the isochromatic fringe field, whole field isoclinic data is also obtained for the first time in implant dentistry, which could throw important information in improving the structural stability of the implant systems. Analysis is carried out for the implant in the molar as well as the incisor region. In addition, the interaction effects of loaded molar implant on the incisor area are also studied. © 2016 Elsevier B.V., All rights reserved.

Item Type: Article
Subjects:
Divisions: Dentistry > Vinayaka Mission's Sankarachariyar Dental College, Salem
Depositing User: Unnamed user with email techsupport@mosys.org
Last Modified: 09 Dec 2025 12:10
URI: https://vmuir.mosys.org/id/eprint/4010

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